The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 1998

Filed:

Jan. 29, 1996
Applicant:
Inventors:

Yoshio Koike, Kawasaki, JP;

Tsuyoshi Kamada, Kawasaki, JP;

Syun Tsuyuki, Kawasaki, JP;

Noriaki Furukawa, Kawasaki, JP;

Shigeru Masuda, Kawasaki, JP;

Satoshi Murata, Kawasaki, JP;

Tadashi Hasegawa, Kawasaki, JP;

Takashi Sasabayashi, Kawasaki, JP;

Seiji Tanuma, Kawasaki, JP;

Takatoshi Mayama, Kawasaki, JP;

Katufumi Ohmuro, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F / ;
U.S. Cl.
CPC ...
349126 ; 349124 ; 349129 ;
Abstract

An element division liquid crystal display device with a liquid crystal inserted between first and second plates having alignment films, respectively. The alignment film of at least the first plate includes a single layer of alignment material having a plurality of first and second adjacent domains A and B and is continuously rubbed in one direction through first and second minute domains A and B. A further treatment, different from a rubbing treatment, is effected to the single alignment layer so that a pretilt angle of the liquid crystal contacting the alignment layer at one of the first and second domains is different from the pretilt angle of the liquid crystal contacting the alignment layer at the other domain. The further treatment includes one of the steps of irradiating with UV light, changing the chemical components of the material of the alignment layer, heating or changing the precuring process.


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