The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 1998
Filed:
Nov. 27, 1996
Applicant:
Inventors:
Tae Song Kim, Seoul, KR;
Hyung Jin Jung, Seoul, KR;
Do Kyung Kim, Daejeon, KR;
Yoon Chang Kim, Daejeon, KR;
Assignee:
Korea Institute of Science and Technology, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B / ;
U.S. Cl.
CPC ...
219678 ; 219711 ; 219762 ; 118725 ; 1187 / ; 427595 ;
Abstract
A rapid thermal processing method for a ceramic thin film which is capable of carrying out a uniform heating of a large sized wafer, and of achieving a rapid temperature elevation, and of enhancing a crystallinity of a deposited thin film, wherein a thin film-coated material is disposed on a support to rapidly heat the thin film by the application of microwaves, the temperature is measured with a temperature measuring unit, and the generation of the microwaves is halted at a required temperature.