The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 1998
Filed:
Jul. 26, 1996
John E Cronin, Milton, VT (US);
Carter W Kaanta, Colchester, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming sub-lithographic elements and spaces therebetween where the pitch may be reduced with continuously adjustable line and space dimensions, and a structure resulting from the method, are disclosed. A plurality of spaced convertible members are formed on a substrate. A portion of each member is then converted, thereby reducing the dimensions of the unconverted portion of the member while increasing the width of the member plus its converted layer. A conformal layer of material is then deposited over the converted members, followed by directional etching of the conformal layer. The unconverted portion of the member is then removed. The line and space dimensions can be continuously adjusted by altering either or both of the member's converted layer and conformal layer.