The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 1998
Filed:
Oct. 10, 1996
Applicant:
Inventors:
Takashi Itoh, Tokyo, JP;
Hiroyuki Saitoh, Tokyo, JP;
Haruyuki Kinami, Tokyo, JP;
Toshinori Konaka, Tokyo, JP;
Tsuyoshi Murai, Tokyo, JP;
Assignee:
M. Setek Co., Ltd., , JP;
Primary Examiner:
Int. Cl.
CPC ...
B08B / ; B08B / ;
U.S. Cl.
CPC ...
134-6 ; 134-7 ; 134 32 ; 134 33 ; 134 26 ;
Abstract
An improved method for scrubbing a substrate, the method including the step of scrubbing one face of the substrate with a cylindrical rotary brush while applying back pressure to the substrate by jetting a fluid for generating back pressure against the other face of the substrate.
Itoh, Takashi. (1998). Method for scrubbing substrate (U.S. Patent No. 5795401). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5795401
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile