The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 1998
Filed:
Aug. 23, 1996
Tadashi Takeda, Nagano, JP;
Yoshio Hayashi, Nagano, JP;
Satoru Nakao, Tokyo, JP;
Hideo Takezoe, Tokyo, JP;
Ken Ishikawa, Tokyo, JP;
Takaaki Suzuki, Tokyo, JP;
Atsuo Fukuda, Tokyo, JP;
Sankyo Seiki Mfg. Co., Ltd., Nagano-ken, JP;
Abstract
A polarizing beam-splitter comprises an optically isotropics crystalline substrate and a birefringent material layer made of an oriented polydiacetylene film formed on the optically isotropic crystalline substrate. A periodic grating photo-mask is formed in the birefringent material layer by an area that is changed into a different color phase when an ultra violet light is irradiated in a predetermined pattern on the birefringent material layer and by an area in which the color remains unchanged. The periodic grating photo-mask has a diffraction efficiency for the orientation of the oriented polydiacetylene film in the area that is changed into a different color phase which is lower than that in the area in which the color is unchanged.