The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 1998
Filed:
Jul. 19, 1994
Ernst Luder, Stuttgart, DE;
Traugott Kallfass, Grossbottwar, DE;
Hubert Benzel, Pliezhausen, DE;
Joerg Schaepperle, Stuttgart, DE;
Endress + Hauser GmbH + Co., Maulburg, DE;
Abstract
In a first variant of this pressure sensor with a substrate and a diaphragm which are joined together parallel to each other in a defined spaced relationship, forming a chamber sealed at least at the edge, the chamber-side surface of the diaphragm is completely covered with a diaphragm electrode. The chamber-side surface of the substrate supports a reference electrode consisting of an outer portion, which extends along the edge of the chamber and whose capacitance is virtually pressure-independent, and a pressure-dependent central portion, which is located at the center of the substrate and is connected with the outer portion via a connecting portion. The remainder of the substrate surface is covered with a measuring electrode spaced from the reference electrode by a constant distance. In a second circular variant and in a third, rectangular variant, the reference electrode consists of an outer portion, which extends along the edge of the chamber and whose capacitance is virtually pressure-independent, and two pressure-dependent central portions, which are each located in one half of the substrate symmetrically with respect to the substrate center and are connected with the outer portion via one connecting portion each, and whose boundary curves are continuous and are optimized by an iterative method. In a third variant, the reference electrode differs from that of the second variant in that it is not centrosymmetrical, but symmetrical with respect to a substrate diameter.