The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 1998
Filed:
Aug. 22, 1996
Applicant:
Inventors:
Akira Yamashita, Hiratsuka, JP;
Koichi Furukawa, Tokyo, JP;
Teruaki Orikasa, Yokohama, JP;
Noriaki Goto, Yamanashi-ken, JP;
Shigeki Matsunaka, Yokohama, JP;
Yoshitaka Kawada, Tokyo, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427555 ; 427162 ; 427264 ; 427270 ; 427272 ; 427282 ; 4273831 ; 4273855 ; 427404 ; 4274071 ; 427595 ;
Abstract
A copper film layer and a resin film are sequentially layered on a skin material, the resin film is irradiated with a laser beam so as to be removed, a mask is formed on the copper film layer by use of the residual of the resin film, thereafter, an etching process is provided thereto, so that a copper film layer pattern is formed on the reflective surface of the skin material.