The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 1998
Filed:
Jun. 10, 1997
Robin Frederick Farrow, San Jose, CA (US);
Ronald Franklin Marks, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for forming a chemically-ordered ferromagnetic or antiferromagnetic metal alloy film allows the temperature and/or time required for annealing to be reduced. The ferromagnetic or antiferromagnetic metal alloy film is dosed with hydrogen either during or subsequent to deposition of the film on a substrate. The metal alloy film is then heated to desorb the hydrogen atoms from the metal alloy. In one embodiment for dosing the metal alloy film with hydrogen a transition metal of the type that catalyzes the dissociative chemisorption of H.sub.2, such as palladium (Pd), is deposited as a film in contact with the metal alloy film. The Pd film is then heated and while at an elevated temperature, it is exposed to H.sub.2 gas. The H.sub.2 becomes dissociated into hydrogen atoms and the hydrogen atoms become chemically absorbed by the Pd film. During subsequent cooling of the Pd film hydrogen atoms in the Pd film become absorbed into the metal alloy film. When the metal alloy film is annealed the hydrogen atoms become desorbed.