The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 1998

Filed:

Oct. 17, 1997
Applicant:
Inventor:

Masao Futamura, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05C / ; D05B / ; G06F / ;
U.S. Cl.
CPC ...
1121025 ; 11247519 ; 36447009 ; 382197 ;
Abstract

Disclosed is an embroidery data processing device. First image data representative of two-dimensionally extending areas, and second image data representative of linearly extending areas are extracted, and then processed in accordance with different algorithms. To the two-dimensionally extending areas, an edge tracing process is applied to obtain outlines thereof, and to the linearly extending areas, a thinning process is applied to obtain paths defined thereby. Different types of stitches are assigned to the extracted areas.


Find Patent Forward Citations

Futamura, Masao. (1998). Embroidery data processing device and method (U.S. Patent No. 5791271). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5791271

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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