The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 1998

Filed:

Dec. 19, 1996
Applicant:
Inventor:

Tomohiko Mori, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05B / ; D05C / ;
U.S. Cl.
CPC ...
1121025 ; 112445 ; 11247004 ; 11247519 ; 36447009 ;
Abstract

A sewing pattern is located with respect to a predetermined sewable region (103) based on sewing pattern data indicative of a shape of the sewing pattern. The angular position of the sewing pattern can be changed into another angular position. It is judged whether or not the angular position-changed sewing pattern fits within the sewable region. When it is judged that the angular position-changed sewing pattern fails to fit within the sewable region, the angular position of the sewing pattern is further changed into still another angular position. It is indicated that the angular position of the sewing pattern has been further changed.


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