The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1998
Filed:
Sep. 15, 1995
Joseph Philip Olive, Watchung, NJ (US);
Jan Pieter VanSanten, Brooklyn, NY (US);
Lucent Technologies, Inc., Murray Hill, NJ (US);
Abstract
A system and method are provided for automatically computing local pitch contours from textual input to produce pitch contours that closely mimic those found in natural speech. The methodology of the invention incorporates parameterized equations whose parameters can be estimated directly from natural speech recordings. That methodology incorporates a model based on the premise that pitch contours instantiating a particular pitch contour class can be described as distortions in the temporal and frequency domains of a single, underlying contour. After the nature of the pitch contour for different pitch contour classes has been established, a pitch contour can be predicted that closely models a natural speech contour for a synthetic speech utterance by adding the individual contours of the different intonational classes and adjusting the boundaries of these to match the boundaries of the adjacent intonation curves.