The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1998
Filed:
Aug. 20, 1996
John Edward Sipe, Toronto, Ontario, CA;
Henry Martin Van Driel, Mississauga, Ontario, CA;
Other;
Abstract
A method and apparatus for generating and controlling the propagation of electrons in a semiconductor material using a plurality of beams of coherent light is disclosed. The direction and magnitude of propagation of the electrons in the semiconductor are controlled by varying the polarization of the coherent beams with respect to the semiconductor material, and in particular the crystallographic axis of the semiconductor material. The electrons are generated and controlled by use of three coherent beams which are related such that the frequency of one of the beams is substantially equal to the sum of the frequencies of the other beams, and the first beam produces substantially the same number of electrons in the semiconductor material that the other beams produce together. A selected region of the semiconductor material is simultaneously irradiated with all of the beams of light. The semiconductor material is at approximately room temperature. Holes are also generated and propagate in a direction opposite to the direction of propagation of the electrons.