The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1998
Filed:
Sep. 14, 1995
Donald Umstadter, Ann Arbor, MI (US);
Joon-Koo Kim, Ann Arbor, MI (US);
Evan Dodd, Ann Arbor, MI (US);
The Regents of the Univeristy of Michigan, Ann Arbor, MI (US);
Abstract
The invention provides a novel laser-plasma-based source of relativistic electrons; and a method to use laser-driven plasma waves as the basis for the source of electrons. The technique involves a combination of laser beams, which are focused in a plasma. One beam creates a wakefield plasma wave. In one embodiment, the one beam creates a wakefield plasma wave and the other beam alters the trajectory of background electrons, such that they become trapped in the plasma wave and are then accelerated to relativistic velocities, preferably in a distance less than a millimeter. In another embodiment, the second beam removes electrons from atomic ions previously generated by the first beam thereby providing electrons which become trapped in the plasma wave and then accelerated to relativistic velocities.