The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1998
Filed:
Dec. 24, 1996
Applicant:
Inventor:
Hyoung-joon Kim, Seoul, KR;
Assignee:
Samsung Electronic Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract
Half-tone phase shift masks (PSM) having a high transmittance and can be easy to fabricate are provided. The half-tone PSM includes a substrate which is transparent with respect to exposure light, a phase shifter pattern formed on the transparent substrate, and a phase shifting groove which can be formed by etching the transparent substrate. Methods for fabricating half-tone PSMs are also provided. The half-tone PSM can have a higher transmittance than that of a conventional half-tone PSM, and the phase shifting groove can have a uniform surface. Thus, a fine pattern having an excellent contrast can be formed using a short wavelength.