The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 1998

Filed:

Apr. 16, 1996
Applicant:
Inventor:

Yun Jun Huh, Chungcheongbuk-do, KR;

Assignee:

LG Semicon Co., Ltd., Chungcheongbuk-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; C25F / ;
U.S. Cl.
CPC ...
216 84 ; 216 83 ; 216 97 ; 216 99 ; 438745 ;
Abstract

A wet-etching method which determines a desired etch-ended point includes the steps of providing an etchant solution in a bath, performing the wet-etch process by dipping a material to be etched in the bath, measuring a weight variation value of the material during the wet etch process, calculating a thickness variation value of the material by using the weight variation value, and stopping the wet-etch process when the thickness variation value reaches a preset value.


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