The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 1998
Filed:
Sep. 19, 1995
Toshihiro Hyodo, Ikeda, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
A process simulation apparatus simulates a manufacturing process of a semiconductor device which manufacturing process comprising various processes including an ion implantation process and a diffusion process. Process sequence data which represents conditions of a two-dimensional simulation for each process is input to a memory unit. The memory unit stores the process sequence data and also stores condition information for various simulation models usable for each process. An optimum simulation model for each process is selected for performing a two-dimensional simulation for each process. The semiconductor device manufacturing process is simulated by a two-dimensional simulation method using the selected optimum simulation model.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile