The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1998
Filed:
Dec. 17, 1996
Richard D Lindsay, Brentwood, TN (US);
Plasma Processing Corporation, Brentwood, TN (US);
Abstract
A kiln system for a process for treatment of aluminum dross residue (NMP) having available aluminum nitride (AlN) and/or free aluminum (Al) and/or aluminum chlorides (AlCl.sub.3) having a particle size within the range of 0.3 to 300 microns, i.e., 'fines' to produce a high alumina lightweight aggregate is described. The process is characterized in that the NMP is fed into a rotating sealed kiln and heated to a temperature in the range of 2000.degree. to 4000.degree. F. while feeding oxygen or a mixture of oxygen and water into the kiln with less than about 20% of the total heat energy input for heating the NMP to a temperature between 2000.degree. and 4000.degree. F. being supplied from an external source. The process does not require prior agglomerization of the fines.