The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1998
Filed:
Jul. 12, 1996
Applicant:
Inventor:
Yun Jun Huh, Seoul, KR;
Assignee:
LG Semicon Co., Ltd., Chungcheongbuk-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ; H01L / ;
U.S. Cl.
CPC ...
216 59 ; 216 61 ; 438 14 ; 438 17 ;
Abstract
A method for determining an etch-ending point using a vapor etch apparatus having a chamber is disclosed including the steps of providing a vapor-state etchant in the chamber, inserting a material to be etched in the chamber and etching the material by the etchant, measuring an ion current intensity of a by-product generated during the vapor etch process, calculating a thickness variation value of the material by using the ion current intensity value, and stopping the vapor etch process when the thickness variation value reaches a preset value.