The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 1998

Filed:

Feb. 27, 1997
Applicant:
Inventors:

Christopher A Lacey, San Diego, CA (US);

Kenneth H Womack, San Diego, CA (US);

Assignee:

Phase Metrics, San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356357 ; 356360 ;
Abstract

An apparatus and method for measuring the topographic profile of a reflective member having an index of refraction. The apparatus comprises a first optical system that reflects a light beam from the reflective member and detects the reflected light beam. A second optical system directs the light beam to interfere with the reflected light beam and detects the resulting interference pattern. A processor coupled to the first optical system and the second optical system computes the index of refraction of the reflective member from the detected reflected light beam and provides the topographic profile of the reflective member from the index of refraction and the interference pattern.


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