The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 1998

Filed:

May. 25, 1994
Applicant:
Inventors:

Archie Harvin Mahan, Golden, CO (US);

Edith C Molenbroek, Boulder, CO (US);

Brent P Nelson, Golden, CO (US);

Assignee:

Midwest Research Institute, Kansas City, MO (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438482 ; 438485 ; 427 99 ; 148D / ;
Abstract

A method of producing hydrogenated amorphous silicon on a substrate by flowing a stream of safe (diluted to less than 1%) silane gas past a heated filament.


Find Patent Forward Citations

Mahan, Archie. (1998). Deposition of device quality, low hydrogen content, amorphous silicon (U.S. Patent No. 5776819). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5776819

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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