The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 1998

Filed:

Sep. 29, 1995
Applicant:
Inventors:

Claus-Peter Niesert, Frankfurt, DE;

Georg Pawlowski, Tokyo, JP;

Willi-Kurt Gries, Wiesbaden, DE;

Klaus-Juergen Przybilla, Frankfurt, DE;

Assignee:

AGFA-Gevaert AG, Leverkusen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; C08J / ; C08G / ; C08G / ;
U.S. Cl.
CPC ...
4302811 ; 522 40 ; 522904 ; 522905 ; 556436 ; 556427 ; 556425 ; 544 69 ; 544229 ; 546 14 ; 548406 ; 548110 ; 549-4 ; 549214 ; 552209 ;
Abstract

Compounds of the general formula I: (SIL--X--).sub.m IN (I), in which SIL is a radical of the formula Si(R.sup.1)(R.sup.2)(R.sup.3), where R.sup.1 is an alkyl, haloalkyl or alkoxy radical of 1 to 8 carbon atoms, an alkenyl radical, an alkenyloxy or acyloxy radical of 2 to 8 carbon atoms, an aryl or aryloxy radical of 6 to 10 carbon atoms, or a dialkyl-, diaryl- or alkylaryl-methyleneaminooxy radical having C.sub.1 -C.sub.4 -alkyl or C.sub.6 -aryl groups; and R.sup.2 and R.sup.3 are identical or different radicals with the meaning of R.sup.1 or X--IN; X is a group C.sub.n H.sub.2n ; IN is the radical of a compound which is active as a photoinitiator or photosensitizer and which has at least one carbonyl group located on an aromatic nucleus; m is a number from 1 to 4; and n is a number from 2 to 12, or of the formula II: Si.sub.o O.sub.o-1 (--X--IN).sub.p R.sup.4.sub.2o+2-p (II), in which R.sup.4 is a radical with the meaning of R.sup.1, and two or more radicals R.sup.4 may be the same as or different from one another; o is a number from 2 to 20,000; and p is a number from 1 to o, and the symbols X and IN are as defined above, the group X being attached to an aromatic carbon atom which is positioned ortho to the carbonyl group of IN. The compounds are prepared by reacting a compound IN--H with a compound SIL--X' or a compound Si.sub.o O.sub.o-1 (--X').sub.p R.sup.4.sub.2o+2-p in the presence of a ruthenium compound. They are suitable as radical-forming photoinitiators or as photosensitizers in silicone-containing photopolymerizable mixtures, in particular for the production of waterless-printing planographic printing plates.


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