The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 1998
Filed:
Mar. 19, 1996
Applicant:
Inventors:
Mitsuie Matsumura, Tokyo, JP;
Toshio Shinoki, Tokyo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B01J / ; H01M / ;
U.S. Cl.
CPC ...
422197 ; 429 16 ; 429 20 ;
Abstract
A reforming reactor includes a reforming chamber for reforming a reaction gas containing hydrocarbon or alcohol to a combustion gas containing hydrogen by a reforming reaction, a plurality of gas flow passages disposed in the reforming chamber for guiding the reaction gas from an inlet side toward an outlet side thereof, and reforming blocks provided in a plurality of predetermined sections of each of the gas flow passages and containing reforming catalysts with which the reaction gas flowing through the gas flow passages is brought into contact.