The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1998
Filed:
Jul. 18, 1996
Ryuichi Sato, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for and a method of producing devices, in which an original pattern such as a reticle is projected onto an object such as a wafer to be exposed, through a projection optical system. The projection optical system includes at least one optical element, optical characteristics thereof having been tested using a measuring beam having a first wavelength region. An exposure light source emits a light beam having a second wavelength region, selected independently from the first wavelength region, to irradiate the original pattern with the beam from the exposure light source, so that an image of the pattern is projected onto the object through the projection optical system, thereby exposing the object to produce the device.