The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1998
Filed:
Aug. 01, 1997
Applicant:
Inventors:
Rae Lynn Emley, Buffalo, NY (US);
James Joseph Maloney, Amherst, NY (US);
Assignee:
Praxair Technology, Inc., Danbury, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F25J / ;
U.S. Cl.
CPC ...
62639 ; 62923 ;
Abstract
The production of higher purity helium wherein a feed comprising helium, nitrogen and hydrocarbons is processed in a system comprising two columns operating at different pressure levels, with the product helium produced in the higher pressure column and nitrogen and hydrocarbons cycled to the lower pressure column.
Emley, Rae. (1998). Cryogenic rectification system for producing higher purity helium (U.S. Patent No. 5771714). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5771714
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile