The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 1998

Filed:

Aug. 27, 1996
Applicant:
Inventors:

Anastasios Tsonis, Conestogo, CA;

Brian J Goldberg, Thornhill, CA;

Aaron Martin Divinsky, Mississauga, CA;

Alexander Nicolaou, Mississauga, CA;

Benito Chia, Jr, Mississauga, CA;

Niranjan Mayya, Mississauga, CA;

Assignee:

Pulse Microsystems, Ltd., Mississauga, US;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ; G06G / ; G06G / ;
U.S. Cl.
CPC ...
36447002 ; 11247519 ;
Abstract

The present invention is an improved method for automatically generating chenille filled embroidery stitch patterns and/or claim stitching in a computer aided design system in which the shape to be filled is a complex polygon. Concentric polygons are constructed, such as either by using the medial axis of the polygon or by constructing offset elements and joining arcs without use of the medial axis, and sorted, and spirals are placed along the polygons with stitches being placed along the spirals. For chain stitching, rather than placing spirals, the chain stitches are placed on the perimeter of the concentric polygons.


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