The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1998
Filed:
Nov. 10, 1997
Gangfeng Cai, West Chester, PA (US);
Daniel M Trauth, West Chester, PA (US);
Lau S Yang, Wilmington, DE (US);
Arco Chemical Technology, L.P., Greenville, DE (US);
Abstract
Processes for making storage-stable epoxy-capped polyetherester resins are disclosed. In one process, a polyetherester resin is first made by inserting a carboxylic acid derivative into a polyether. Reacting the resin with a capping agent gives an intermediate resin with a reduced content of free carboxylic acid groups. Finally, the intermediate resin reacts with an epoxy compound in the presence of a finishing catalyst under conditions effective to give an epoxy-capped resin. The resins have low weight average molecular weights (less than about 8000), narrow molecular weight distributions (less than 6), and low viscosities, making them an excellent choice for low-VOC formulations. The finishing catalyst helps to minimize resin viscosity drift and improves shelf stability. Curing the resins with a vinyl monomer gives thermosets with an excellent balance of physical properties, including excellent water resistance.