The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 1998

Filed:

Oct. 04, 1996
Applicant:
Inventors:

John C Linehan, Richland, WA (US);

John L Fulton, Richland, WA (US);

Roger M Bean, Richland, WA (US);

Assignee:

Battelle Memorial Institute, Richland, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01G / ; C01G / ; C01G / ;
U.S. Cl.
CPC ...
4235611 ; 208420 ; 252309 ; 252314 ; 423558 ; 423566 ; 423633 ; 423634 ; 502338 ;
Abstract

The present invention is directed to a process for producing a nanometer-sized metal compound. The process comprises forming a reverse micelle or reverse microemulsion system comprising a polar fluid in a non-polar or low-polarity fluid. A first reactant comprising a multi-component, water-soluble metal compound is introduced into the polar fluid in a non-polar or low-polarity fluid. This first reactant can be introduced into the reverse micelle or reverse microemulsion system during formation thereof or subsequent to the formation of the reverse micelle or microemulsion system. The water-soluble metal compound is then reacted in the reverse micelle or reverse microemulsion system to form the nanometer-sized metal compound. The nanometer-sized metal compound is then precipitated from the reverse micelle or reverse microemulsion system.


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