The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 1998

Filed:

Jun. 05, 1996
Applicant:
Inventors:

David J Roach, Los Gatos, CA (US);

Richard F Johnston, Murphys, CA (US);

Assignee:

Molecular Dynamics, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
422 63 ; 422 65 ; 422100 ; 436174 ; 436180 ; 7386402 ;
Abstract

A microspot deposition system featuring a hollow cylindrical wall extending from a closed end, terminating in an open end and including a longitudinal gap extending from the open end toward the closed end to allow the rapid exhaustion of the atmosphere and efficient cleaning within the cylindrical wall. The cylindrical wall defines a lumen with both the lumen and the gap adapted to facilitate capillary action of liquid in fluid communication therewith to form a meniscus proximate to the open end. To facilitate deposition of liquid contained within the lumen, the gap may be tapered so that it is narrowest proximate to the open end. The narrowed portion of the gap results in a meniscus having a reduced area to ensure preferential fluid flow toward the open end, which facilitates deposition via capillary action between the liquid in the lumen and a working surface on which the liquid is to be deposited.


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