The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1998
Filed:
Dec. 11, 1995
Applicant:
Inventors:
Yasuhiro Kamihara, Hachioji, JP;
Hitoshi Ohashi, Hachioji, JP;
Assignee:
Olympus Optical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C / ;
U.S. Cl.
CPC ...
264-127 ; 216 24 ; 216 54 ; 216 67 ; 264-133 ; 264-25 ; 264219 ; 264220 ; 4251744 ; 425810 ;
Abstract
A method of manufacturing a die for optical elements having a given construction on a relief type grating or the like is disclosed. The method includes the steps of: forming a workpiece film on a substrate; machining the workpiece film in a required configuration; subjecting the workpiece film machined in the required form and the substrate to etching to transfer the configuration of the workpiece film on the substrate analogously in the depth direction; and forming a die by using the etched substrate as a master matrix.