The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1998
Filed:
Feb. 28, 1996
Applicant:
Inventors:
David Cossaboon, Christiana, DE (US);
Jiun-Fang Wang, Hockessin, DE (US);
Lee Melbourne Cook, Steelville, PA (US);
Assignee:
Rodel, Inc., Newark, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451 41 ; 51308 ; 106-3 ; 451 36 ;
Abstract
A composition is provided, which is suitable for polishing SiO.sub.2, silicates, and silicon nitride, comprising an aquesous slurry of submicron SiO.sub.2 particles and a soluble inorganic salt or combination of soluble inorganic salts of total solution concentration below the critical coagulation concentration for the slurry, wherein the slurry pH is adjusted to within the range of about 9 to 10 by addition of a soluble amine or mixture of soluble amines. Optionally, the compositions of this invention may also comprise a polyhydric alcohol.