The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1998
Filed:
Oct. 04, 1995
David N Levin, Chicago, IL (US);
Robert P Grzeszczuk, Oak Park, IL (US);
Arch Development Corp., Chicago, IL (US);
Abstract
A method for segmenting an image in which an arbitrarily shaped contour is deformed stochastically until it approximates the contour of a target object. The evolution of the contour is controlled by a simulated annealing process which causes the contour to settle into a global minimum of an image-derived 'energy' function. The non-parametric energy function is derived from the statistical properties of previously-segmented training images. High computational complexity is avoided by using an efficient method of introducing a random local perturbation, and assuring the resulting shape changes are unbiased. This method for perturbing the contour allows for execution times several orders of magnitude shorter than in simple implementations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile