The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1998
Filed:
Dec. 27, 1995
Applicant:
Inventors:
Shigeki Maegawa, Moriguchi, JP;
Mamoru Furuta, Moriguchi, JP;
Hiroshi Tsutsu, Osaka, JP;
Tetsuya Kawamura, Hirakata, JP;
Yutaka Miyata, Ikoma, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438166 ; 438487 ; 438308 ; 148D / ; 117-8 ; 117904 ;
Abstract
A method for forming a polycrystalline semiconductor thin film according to the present invention includes the steps of: forming a semiconductor thin film partially containing microcrystals serving as crystal nuclei for polycrystallization on an insulating substrate; and polycrystallizing the semiconductor thin film by laser annealing.
Maegawa, Shigeki. (1998). Method for forming polycrystalline thin film and method for fabricating (U.S. Patent No. 5766989). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5766989
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile