The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1998
Filed:
Oct. 23, 1996
Harold R Kaufman, LaPorte, CO (US);
Front Range Fakel, Inc., Ft. Collins, CO (US);
Abstract
Closed-drift ion sources of the magnetic-layer and anode-layer types are shown and described, with both one-stage and two stage versions of the latter included. Specific improvements include the use of a magnetically permeable insert in the closed drift region together with an effectively single source of magnetic field to facilitate the generation of a well-defined and localized magnetic field while, at the same time, permitting the placement of that magnetic field source at a location well removed from the hot discharge region. Such a configuration is also well suited to the use of a permanent magnet as the magnetic field source. In one embodiment a baffle arrangement serves to distribute the ionizable gas uniformly circumferentially and decrease its pressure below the Paschen-law minimum before exposure to the anode potential.