The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 1998

Filed:

Jun. 14, 1995
Applicant:
Inventors:

Oh-Kil Kim, Burke, VA (US);

Ling-Siu Choi, Bethesda, MD (US);

Heyi Zhang, Baltimore, MD (US);

Xue Hua He, Baltimore, MD (US);

Yan Huh Shih, Ellicott City, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B32B / ; G02B / ;
U.S. Cl.
CPC ...
428221 ; 252582 ; 385122 ; 428332 ; 428409 ; 4284111 ;
Abstract

Inclusion complexes have an organic guest molecule dye with an electron dr portion, an electron acceptor portion and a hydrophobic tail portion disposed within an organic carbohydrate host molecule. The dye in the inclusion complexes has improved thermal stability compared to itself. The complexes can be used to form a solution-cast film disposed on a substrate wherein the film thickness is up to about 20 microns and the film is made of anisotropically self-aligned (self-poled) inclusion complexes.


Find Patent Forward Citations

Loading…