The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1998
Filed:
Jun. 25, 1996
Bruce H Weiller, Santa Monica, CA (US);
The Aerospace Corporation, El Segundo, CA (US);
Abstract
Chemical vapor deposition of titanium nitride thin films is based upon the gas phase kinetics of the reaction of a metal-amido precursors, e.g. tetrakis dimethylamido titanium (Ti(NMe.sub.2).sub.4), which when reacted with a reagent, for example, NH.sub.3 produces in a transamination reaction, an amine, e.g. HNMe.sub.2, as a direct product, which when added to the reaction in excess, inhibits the reversible transamination reaction so as to slow and control the rate of reaction to produce titanium nitride films having conformal step coverage over sub-micron integrated circuit features.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile