The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1998
Filed:
Jun. 20, 1996
Mitsubishi Jukogyo Kabushiki Kaisha, Tokyo, JP;
Abstract
This invention relates to a flue gas treating system including a desulfurization apparatus for bringing flue gas into contact with a calcium compound-containing slurry so as to cause sulfur dioxide present in the flue gas to be absorbed into the slurry, oxidizing the slurry having undergone contact with flue gas, and subjecting the oxidized slurry to solid-liquid separation so as to obtain gypsum as a by-product; a waste water treating apparatus for treating part of a first filtrate produced during solid-liquid separation of the slurry having undergone contact with flue gas in the desulfurization apparatus; and solid-liquid separation device for subjecting sludge produced in the waste water treating apparatus to solid-liquid separation independently of the slurry having undergone contact with flue gas, wherein a solid material separated from the sludge by the solid-liquid separation device is incorporated into the gypsum and all of a second filtrate produced during solid-liquid separation of the sludge by the solid-liquid separation device is introduced into the waste water treating apparatus together with part of the first filtrate. In this system, the dumping disposal of sludge produced in the waste water treating apparatus is not required and the concentration of impurities in the absorbent slurry within the desulfurization apparatus can be kept on a low level.