The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1998
Filed:
Jun. 20, 1996
Stephen Gulick, Jr, Rochester, NY (US);
Frederick Conrad Enrich, Rochester, NY (US);
Roger Roy Morton, Penfiled, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method of improving uneven illumination in a contact printer having an original image position and a light source to illuminate the original image position, which light source may illuminate the original image position non-uniformly, the method comprising: first forming a mask by exposing a photographic element to the light source and processing the element to form a negative image of the light source at a filtering position between the light source and the original image position; and positioning the mask at the filtering position. A second aspect of the method uses an electronic processor and gathered illumination data, to generate a mask.