The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 1998

Filed:

Apr. 18, 1996
Applicant:
Inventors:

Raymond Van Roijen, Yorktown Heights, NY (US);

Petrus JA. Thijs, 5621 BA Eindhoven, NL;

Patrick H Van Gestel, 5621 BA Eindhoven, NL;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S / ; H01L / ;
U.S. Cl.
CPC ...
438 23 ; 438 38 ; 438 44 ; 438 47 ;
Abstract

A passive region is provided adjacent the mirror surface of a laser. A mesa is formed with an end face parallel to the mirror surface to be formed. The passive region is grown against the end face, and the mirror surface is formed therein by cleaving. The passive region is provided exclusively at the area of the active region. The passive region is provided at the area of the active region preferably in the following manner: two depressions are formed in the layer structure of the laser at the area of the mirror surface to be formed, reaching down to the active layer. Then a portion of the active layer situated between the depressions is selectively removed, whereupon the passive region is grown starting from the depressions in the tubular cavity thus formed.


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