The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1998
Filed:
Mar. 21, 1997
Satoru Fukuoka, Yamanashi-ken, JP;
Hiroyuki Kosaka, Yamanashi-ken, JP;
Pioneer Electronic Corporation, , JP;
Pioneer Video Corporation, , JP;
Abstract
A photo-resist layer of positive type, which is formed by a predetermined thickness on a disc substrate and which is exposed by a light beam modulated in accordance with record information to produce an optical record medium comprising the photo-resist layer and the disc substrate, is developed by the developing method. The developing method includes the steps of: firstly developing the exposed photo-resist layer by alkaline developing solution which has a normality of 0.17 to 0.19N for a first time period such that the photo-resist layer be incompletely developed to a predetermined depth from a surface of the exposed photo-resist layer; firstly washing the firstly developed photo-resist layer to stop the firstly developing step, and firstly drying the firstly washed photo-resist layer; secondly developing the firstly dried photo-resist layer by the alkaline developing solution for a second time period which is longer than the first time period such that the photo-resist layer be completely developed to a pit depth; and secondly washing the secondly developed photo-resist layer to stop the secondly developing step, and drying the secondly washed photo-resist layer to produce the optical record medium recorded with the record information as a developed pit pattern.