The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 1998

Filed:

Jul. 03, 1996
Applicant:
Inventor:

Mark Andrew Logan, Pleasant Valley, NY (US);

Assignee:

Novellus Systems, Inc., San Jose, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08J / ; B05D / ;
U.S. Cl.
CPC ...
427490 ; 427562 ; 427563 ; 427573 ; 4272551 ;
Abstract

In accordance with the invention, a method of depositing substituted fluorocarbon polymeric layers exhibiting a high degree of cross-linking is presented. The substituted fluorocarbon polymeric layers are formed of substituted fluorocarbon polymers in which the carbon functionality in standard fluorocarbon polymers is selectively replaced with a substitute functionality, typically silicon, oxygen or nitrogen. Formation of a substituted fluorocarbon polymeric layer includes placing a substrate into a reactor and, while maintaining the reactor pressure below 100 torr, introducing a process gas into the reactor. Optionally, the substrate is biased. The process gas is then ionized thereby depositing the substituted fluorocarbon polymeric layer on the substrate.


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