The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1998
Filed:
Mar. 11, 1994
Applicant:
Inventor:
Jian-Zhi Zang, North Branford, CT (US);
Assignee:
Jet Process Corporation, New Haven, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427446 ;
Abstract
An 'arrested nucleation' jet vapor deposition system uses sonic jets and moving substrates to produce nanocluster-embedded films in which semiconductor or metal nanoclusters are trapped in a film of hard, inorganic host materials. CdSe films fabricated at high rate and room temperature in accordance with the present invention show unusual nonlinear optical behavior. Nanoclusters have unique size dependent properties and nanocluster based films have applications in optics and electronics.
Zang, Jian-Zhi. (1998). Jet vapor deposition of nanocluster embedded thin films (U.S. Patent No. 5759634). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5759634
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile