The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1998
Filed:
Oct. 04, 1996
Mitsubishi Chemical Corporation, Tokyo, JP;
Abstract
A method of manufacturing a magnetic recording medium having at least a magnetic layer, optionally by means of an underlayer, on a non-magnetic substrate, and occasionally having a protective layer disposed on the magnetic layer, comprises irradiating to the surface of the non-magnetic substrate, the underlayer, the magnetic layer, the protective layer or the magnetic recording medium, a laser beam from a semiconductor laser module that moves relatively to the non-magnetic substrate, thereby applying a texturing; and a semiconductor laser texturing apparatus comprises a substrate rotating mechanism, a semiconductor laser module including a semiconductor laser beam source, a collimator for converting a semiconductor laser beam into a parallel beam and a light focusing mechanism for irradiating the laser beam to a projection-forming surface of a substrate supported rotatably by the substrate rotating mechanism, and a relative moving mechanism for the substrate supported rotatably by the substrate rotating mechanism and the semiconductor laser module.