The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1998
Filed:
Jan. 29, 1997
Yuki Motoyama, Tsukuba, JP;
Tomoyuki Yui, Tsukuba, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Abstract
A process for the production of a phenol derivative of the formula (2), which comprises subjecting a diester compound of the formula (1) in which a hydroxyl group is protected by an acyl group, to a reaction for removal of protection, wherein the reaction is carried out in the presence of an aliphatic amine as a protection-removal agent, ##STR1## wherein X is hydrogen or fluorine, Y is --CH.sub.3 or --CF.sub.3, Q is an alkyl group having 1 to 4 carbon atoms, p is 0 or 1, m is an integer of 2 to 7, n is an integer of at least 1, and C* is an asymmetric carbon, the process enabling to obtain the phenol derivative of the formula (2) useful as an intermediate for a liquid crystal compound with ease and at high purity.