The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1998
Filed:
Mar. 22, 1994
Yasuo Manabe, Kawasaki, JP;
Fujitsu Limited, Kanagawa, JP;
Abstract
A method for processing exposure data corresponding to a pattern formed on a wafer includes the steps of (a) generating electron dose data relating to exposure per each pattern in an area to be exposed, (b) calculating exposure distance data which shows a degree to correct the electron dose data based on positional relations of each pattern as a pattern to be corrected in sequence with patterns in a predetermined range in the periphery thereof, based on the electron dose data determined by the step (a), (c) correcting the electron dose data determined by the step (a) with the exposure distance data determined by the step (b) to generate corrected electron dose data of each pattern, and (d) calculating an irradiation amount of each pattern based on the corrected electron dose data.