The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1998
Filed:
Jan. 22, 1993
Yoshiharu Okino, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In the improved image exposing apparatus, light beams of different wavelengths in narrow bands that issue from a plurality of light sources are admitted into a light deflector at different angles and substantially the same main scanning line defined on a light-sensitive material is scanned sequentially at predetermined time intervals by the reflected and deflected light beams. The apparatus is so designed that only one light beam will be admitted into a start synchronizing sensor when start synchronization is to be effected. Thus, even if the beam intensity of any one of the rasters produced in a multi-beam varied angle incidence optical system is not significantly higher than the sensitivity of the start synchronizing sensor which is to perform line synchronization for individual rasters, the intended line start synchronization can positively be effected when a write (exposure) mode is performed on a color light-sensitive material by each raster, whereby the light-sensitive material can be effectively exposed to produce a satisfactory image without defects such as color mismatch.