The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1998
Filed:
Apr. 30, 1996
Donna Rizzone Cote, Dutchess County, NY (US);
William Joseph Cote, Dutchess County, NY (US);
Donna Diane Miura, Dutchess County, NY (US);
Christopher Joseph Waskiewicz, Dutchess County, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An inert gas, such as helium, nitrogen, or argon, is used for pressurization and stabilization in a chemical vapor deposition process that occurs in an ambient temperature in excess of 400.degree. C. Using the inert gas in the pressurization and stabilization stages of the chemical vapor deposition process eliminates the formation of tungsten oxides on tungsten studs, lines and other devices in the substrate, thereby eliminating the variable contact resistance and other problems associated with tungsten oxides.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile