Exposure method and exposure apparatus using the same

Abstract

An exposure method for use with an exposure apparatus that includes a projection optical system for projecting a pattern of a first object onto a second object, a mark position detecting optical system having a detection zone at a predetermined position with respect to the projection optical system, for detecting a position of a mark of the second object, and a plurality of surface position detecting devices having different detection zones at different positions predetermined with respect to the projection optical system, for detecting a surface position of the second object. The mark is moved into the detection zone of the mark position detecting optical system, and the surface position of the second object is detected by using the surface position detecting devices. The surface position detecting devices respectively produce plural detection results. A deviation between the mark and the focal plane of the mark position detecting optical system is detected on the basis of (i) the results of the detection of the surface position and (ii) the positional relationship among the detection zone of the mark position detecting optical system and the detection zones of the surface position detecting devices.