The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 1998

Filed:

Feb. 08, 1996
Applicant:
Inventors:

Yuri Yamada, Nagoya, JP;

Shinji Inagaki, Nagoya, JP;

Yoshiaki Fukushima, Aichi-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
4233282 ; 423326 ; 502 80 ; 502263 ;
Abstract

A process for manufacturing a silica porous material with high solid acidity, catalytic activity and adsorption ability as well as excellent crystallinity and heat resistance has the steps of adding a compound of metallic element such as Al to a waterglass, aging the resultant mixture, calcining the aged mixture to form a layered crystal, incorporating an organic substance between layers of the layered crystal, calcining the resultant layered crystal for crosslinking the layered crystal. By this process, a plurality of layers formed of SiO.sub.4 tetrahedral and metallic oxide constitute a silica porous material, and the gap between adjacent layers of the layered crystal is reduced at a crosslinking site, while the gap of the other portion is expanded to form a micro pore.


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Yamada, Yuri. (1998). Process for manufacturing a silica porous material (U.S. Patent No. 5750085). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5750085

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