The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 1998

Filed:

Nov. 29, 1996
Applicant:
Inventors:

Luc Leenders, Herentals, BE;

Geert Defieuw, Bonheiden, BE;

Bart Horsten, Rumst, BE;

Hans Strijckers, Oudergem, BE;

Assignee:

AGFA-Gevaert N.V., Mortsel, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41M / ;
U.S. Cl.
CPC ...
503201 ; 427150 ; 427152 ; 430620 ; 503202 ; 503207 ; 503210 ; 503226 ;
Abstract

A (photo)thermographic recording material comprising a (photo-addressable) thermosensitive element, a support and an outermost antistatic layer, the thermosensitive element comprising a substantially light-insensitive organic silver salt, an organic reducing agent for the substantially light-insensitive organic silver salt in thermal working relationship therewith and a binder, characterized in that the outermost antistatic layer is an organic layer with a resistivity of <10.sup.10 .OMEGA./.quadrature. at a relative humidity of 30%. The outermost antistatic layer may comprise a polythiophene with conjugated polymer backbone in the presence of a polymeric polyanion compound and a hydrophobic organic polymer having a glass transition value (T.sub.g) of at least 40.degree. C., the polythiophene being present at a coverage of at least 0.001 g/m.sup.2 and the weight ratio of the polythiophene to the hydrophobic organic polymer being in the range of 1/10 to 1/1000. A production process for the thermographic recording material and a thermographic recording process therefor are also provided.


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