The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1998
Filed:
Mar. 18, 1997
Matsushita Electric Industrial, Co., Ltd., Osaka, JP;
Abstract
An exposure equipment which is simply configured and can expose fine cyclic patterns whose pitch is smaller than the wavelength of light source has the laser beam 2 (wavelength .lambda.) outgoing from the light source 1 reflected on the mirror 3a, 3b, guided to the beam expander optical system 4, and converged by a focusing lens 4a, passing through a pinhole 4c located on the focal plane of the focusing lens 4a, and converted into parallel beam 5 with the beam diameter expanded by a collimator lens 4b, wherein this parallel beam 5 vertically impinges on and penetrates a phase shifter 6 with recessed portion and protruded portion repeatedly formed on the outgoing surface side of the parallel flat plate configured with transparent material of refraction index n, and as a result, .+-. first order diffracted light is generated, and the .+-. first order diffracted lights interfere with one another on the sensitized film facing the phase shifter via a spacer 7 to form fine fringes, thereby exposing the sensitized film.